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For the Inventor, By the Inventor

Utsunomiya, Japan

Naotake Kobayashi

This inventor holds 10 USPTO granted patents. Top assignee: Sony Corporation. Active years: 1979-1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naotake Kobayashi. Retrieved from https://idiyas.com/inventor/naotake-kobayashi-xyoz2pnw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 10

% Patents Active = 100.0

Average Co-Inventor Count = 2.9

ph-index = 8

Forward Citations = 246(Granted Patents)


Location History:

  • Utsunomiya, JP (1979 - 1988)
  • Tochigi, JP (1988)
  • Kanuma, JP (1987 - 1990)

Company Filing History:

goldMedal10 out of 58,150 
 
Sony Corporation
 patents

Years Active: 1979-1990

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10 patents (USPTO):Explore Patents
1. 4977136 - Cover film for hard copy printing paper (1990-12-11),
2. 4735847 - Electrically conductive adhesive sheet, circuit board and electrical (1988-04-05),
3. 4721703 - Sublimation transfer system color hard copy printing paper (1988-01-26),
4. 4668560 - Sublimation transfer type color hard-copy printing paper (1987-05-26),
5. 4666320 - Ink ribbon for sublimation transfer type hard copy (1987-05-19),
6. 4651645 - Sublimation ink ribbon (1987-03-24),
7. 4599259 - Cover film for sublimation transfer type hard copy (1986-07-08),
8. 4522881 - Cover film for color hard copy printing paper (1985-06-11),
9. 4241198 - Releasing agent (1980-12-23),
10. 4158725 - Method of manufacturing an adhesive (1979-06-19),

Title: Naotake Kobayashi: Innovator in Adhesive Technologies

Introduction

Naotake Kobayashi is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of adhesive technologies, holding a total of 10 patents. His work primarily focuses on developing innovative materials that enhance the performance and functionality of various products.

Latest Patents

One of Kobayashi's latest patents is for a cover film for hard copy printing paper. This invention relates to a cover film that can easily form a colorless and transparent protective layer on the surface of printing paper, particularly for images printed using the sublimation transfer method. The film is designed to include at least one layer with a glass transition temperature higher than 40°C and a water-absorbing ratio lower than 2%. This ensures that even under high temperature and humidity, the adverse effects caused by dye movement are mitigated.

Another notable patent is for an electrically conductive adhesive sheet, which possesses electrical conductivity across its thickness while maintaining electrical insulation along the sheet surface. This adhesive sheet comprises an insulating adhesive material and electrically conductive metal powder uniformly dispersed within it. The metal powder, which has a melting point lower than a specified working temperature, is flattened under pressure between conductors. This innovation allows for the electrical connection of circuit boards while keeping neighboring patterns insulated, thus enhancing the mechanical integration of the circuit board.

Career Highlights

Kobayashi has built a successful career at Sony Corporation, where he has been instrumental in advancing adhesive technologies. His innovative approach has led to the development of products that meet the demands of modern electronics and printing applications.

Collaborations

Throughout his career, Kobayashi has collaborated with notable colleagues, including Yoshio Fujiwara and Tetsuya Abe. These partnerships have fostered a creative environment that has contributed to the success of their projects.

Conclusion

Naotake Kobayashi's contributions to adhesive technologies have made a significant impact in his field. His innovative patents reflect his commitment to enhancing product performance and functionality. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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