Isehara, Japan

Naomi Nagatsuka

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naomi Nagatsuka. Retrieved from https://idiyas.com/inventor/naomi-nagatsuka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1998

Loading Chart...
1 patent (USPTO):Explore Patents

Title: **Inventor Spotlight: Naomi Nagatsuka**

Introduction

Naomi Nagatsuka, an innovative inventor based in Isehara, Japan, has made significant contributions to the field of photolithography with her unique approach to photoresist layers. Her work emphasizes the importance of enhanced preparation techniques that optimize the manufacturing process for semiconductor devices.

Latest Patents

Naomi holds a patent titled "Method for the pre-treatment of a photoresist layer on a substrate." This invention presents an improved method for pre-treating a photoresist layer, crucial before its exposure to actinic rays. The technique focuses on eliminating extraneous portions of the resist layer, which often arise from overspreading the photoresist solution. By utilizing a cleaning solution comprising an aqueous alkaline solution with a specific composition, Naomi's invention stands out from traditional organic solvent-based solutions. This method also allows for the optional inclusion of an anti-corrosion agent, enhancing the efficacy and safety of the cleaning process.

Career Highlights

Naomi is associated with Tokyo Ohka Kogyo Co., Ltd., where she engages in cutting-edge research and development. Her expertise has positioned her at the forefront of innovations in photolithography, making her a valuable asset to her company. The depth of her knowledge and her commitment to improving manufacturing processes are evident in her published works and ongoing projects.

Collaborations

Throughout her career, Naomi has collaborated with esteemed colleagues, including Mitsuru Sato and Koichi Nagasawa. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and further propels advancements in their respective fields.

Conclusion

Naomi Nagatsuka exemplifies the spirit of innovation in the realm of technology and engineering. Her patent not only enhances the precision of photolithography but also contributes to the broader field of semiconductor manufacturing. As she continues her work at Tokyo Ohka Kogyo Co., Ltd., the significance of her contributions will likely resonate throughout the industry for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…