Zama, Japan

Naomi Fujioka


Average Co-Inventor Count = 7.1

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 2000-2016

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3 patents (USPTO):Explore Patents

Title: Innovations of Naomi Fujioka

Introduction

Naomi Fujioka is a prominent inventor based in Zama, Japan. She has made significant contributions to the field of materials science, particularly in the development of advanced sputtering targets. With a total of three patents to her name, her work has implications for electronic components and interconnection films.

Latest Patents

One of her latest patents involves a sputtering target that contains high purity niobium (Nb) with tantalum (Ta) content limited to 3000 ppm or less and oxygen content restricted to 200 ppm or less. This innovation ensures that the dispersion of Ta content across the target is within ±30%, while the oxygen content variation is within ±80%. Such a sputtering target enables the realization of an interconnection film with low resistivity. Additionally, each grain of Nb in the sputtering target has a grain diameter ranging from 0.1 to 10 times the average grain diameter, effectively suppressing the occurrence of giant dust. This sputtering target is particularly suitable for forming an Nb film as a liner material for aluminum interconnections.

Another notable patent focuses on a sputter target made from a titanium-aluminum (Ti-Al) alloy, which contains aluminum in the range of 1 to 30 atomic percent. In this alloy, aluminum exists in either a solid solution state within titanium or as an intermetallic compound with titanium. The variation in aluminum content across the target is limited to 10%, and the average crystal grain diameter of the Ti-Al alloy is kept to 500 micrometers or less, with a variation of 30%. This innovation allows for the formation of a Ti-Al-N film as a barrier film, which is crucial for electronic components that include a barrier film on a semiconductor substrate.

Career Highlights

Naomi Fujioka is currently employed at Kabushiki Kaisha Toshiba, where she continues to innovate in the field of materials science. Her work has garnered attention for its practical applications in the electronics industry.

Collaborations

She collaborates with notable colleagues, including Takashi Ishigami and Takashi Watanabe, contributing to a dynamic research environment that fosters innovation.

Conclusion

Naomi Fujioka's contributions to the field of sputtering targets and materials science highlight her role as a leading inventor. Her patents not only advance technology but also pave the way for

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