Kokubu, Japan

Naoko Itonaga

This inventor holds 1 USPTO granted patent. Top assignee: Kyocera Corporation. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoko Itonaga. Retrieved from https://idiyas.com/inventor/naoko-itonaga

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: Naoko Itonaga: Innovator in Composite Materials

Introduction

Naoko Itonaga is a prominent inventor based in Kokubu, Japan. She has made significant contributions to the field of composite materials, particularly in the development of innovative solutions that enhance performance and reliability.

Latest Patents

Itonaga holds a patent for a composite material, wafer holding member, and method for manufacturing the same. This composite material is composed of SiC, SiO, and at least one of Al or Si, achieving a He leak rate of 1.3×10-9 Pa·m/sec or below. The invention provides a composite material with higher vacuum air-tightness, excellent thermal conductivity, an adjustable coefficient of thermal expansion, small variation in strength, and higher reliability. The patent also includes a method for manufacturing this composite material and a wafer holding member that incorporates it.

Career Highlights

Naoko Itonaga is currently employed at Kyocera Corporation, where she continues to push the boundaries of material science. Her work has been instrumental in advancing technologies that require high-performance materials.

Collaborations

Itonaga collaborates with Kiyoshi Yokoyama, contributing to the innovative projects at Kyocera Corporation.

Conclusion

Naoko Itonaga's contributions to composite materials exemplify her commitment to innovation and excellence in engineering. Her patent reflects her expertise and the potential impact of her work on various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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