Naoko Arima

Title: Naoko Arima: Innovator in Substrate Processing Technology

Introduction

Naoko Arima is a prominent inventor based in Kyoto, Japan. She has made significant contributions to the field of substrate processing, particularly in methods that enhance the efficiency of removing resist materials from substrates.

Latest Patents

Naoko Arima holds a patent for a substrate processing method and apparatus. This innovative method focuses on removing a resist that has a hardened layer from the front surface of a substrate. The process includes a hardened-layer removing step, which involves heating the substrate to 150° C. or more and supplying ozone gas to the heated surface. This step generates oxygen radicals that effectively remove the hardened layer. Following this, a wet processing step is employed, where a processing liquid containing sulfuric acid is used to remove the resist from the substrate's surface.

Career Highlights

Naoko Arima has established herself as a key figure in her field through her work at Screen Holdings Co., Ltd. Her expertise in substrate processing has led to advancements that benefit various applications in technology and manufacturing.

Collaborations

Naoko collaborates with Masaki Inaba, who is also a notable figure in the industry. Their partnership exemplifies the importance of teamwork in driving innovation and achieving breakthroughs in substrate processing technology.

Conclusion

Naoko Arima's contributions to substrate processing technology highlight her role as an influential inventor. Her patented methods not only advance the field but also pave the way for future innovations in substrate processing.