The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2026

Filed:

Mar. 09, 2022
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Masaki Inaba, Kyoto, JP;

Naoko Arima, Kyoto, JP;

Kei Suzuki, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/00 (2026.01); B01F 23/237 (2022.01); B01F 23/70 (2022.01); B01F 35/221 (2022.01); C09K 13/04 (2006.01); H10P 50/64 (2026.01); B01F 101/58 (2022.01);
U.S. Cl.
CPC ...
H10P 72/0422 (2026.01); B01F 23/237613 (2022.01); B01F 23/711 (2022.01); B01F 35/2215 (2022.01); C09K 13/04 (2013.01); H10P 50/642 (2026.01); B01F 2101/58 (2022.01); B01F 2215/0472 (2013.01);
Abstract

A substrate treatment apparatus includes: a substrate treatment unit that treats a substrate with a treatment liquid containing ozone dissolved therein; a recovery tank in which the treatment liquid discharged from the substrate treatment unit is recovered; a recovery pipe that connects the substrate treatment unit to the recovery tank; a heating member that heats the treatment liquid to a first temperature in at least one of the recovery pipe and the recovery tank; a supply piping system that supplies the treatment liquid from the recovery tank to the substrate treatment unit; and an ozone gas pipe that supplies ozone gas to the supply piping system to mix the ozone gas in the treatment liquid passing through the supply piping system.


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