Nirasaki, Japan

Naoki Umehara

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Umehara. Retrieved from https://idiyas.com/inventor/naoki-umehara-pub8zyb9

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Naoki Umehara: Innovator in Substrate Processing Technology

Introduction

Naoki Umehara is a notable inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique patent that enhances the efficiency of substrate processing.

Latest Patents

Umehara holds a patent for a substrate processing apparatus. This apparatus includes a processing container, a stage for placing a substrate, and an exhaust port arranged around the stage. The design features a driver that moves the stage between processing and transfer positions. Additionally, it incorporates a clamp ring to secure the substrate and a pressure regulating mechanism to manage pressure differences effectively. Umehara's patent is a testament to his ingenuity and technical expertise, with 1 patent to his name.

Career Highlights

Naoki Umehara is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in substrate processing technology.

Collaborations

Umehara has collaborated with talented coworkers such as Syuji Nozawa and Ryohei Yoneda. Their combined efforts have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Naoki Umehara's contributions to substrate processing technology exemplify the impact of innovation in the field. His patent and work at Tokyo Electron Limited highlight his role as a key figure in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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