Location History:
- Fukushima-Ken, JP (2011 - 2016)
- Aizuwakamatsu, JP (2016)
Company Filing History:
Years Active: 2011-2016
Title: Naoki Takeguchi: Innovator in Electroplating and Semiconductor Technologies
Introduction
Naoki Takeguchi is a prominent inventor based in Fukushima-ken, Japan. He has made significant contributions to the fields of electroplating and semiconductor device technology. With a total of 4 patents to his name, Takeguchi's work has had a notable impact on the industry.
Latest Patents
One of Takeguchi's latest patents is an "Electroplating apparatus and method with uniformity improvement." This innovative electroplating system features a divided electrode that provides multiple line currents simultaneously during the electroplating process. The system is equipped with a current control component that determines and regulates the magnitude of each line current, ensuring optimal performance.
Another significant patent is the "Ultraviolet blocking structure and method for semiconductor device." This invention outlines structures and methods for blocking ultraviolet rays during the film depositing process for semiconductor devices. In this embodiment, a semiconductor device includes an oxide-nitride-oxide (ONO) film on a substrate, along with a UV blocking layer that suppresses harmful UV rays during additional film deposition.
Career Highlights
Throughout his career, Naoki Takeguchi has worked with notable companies such as Cypress Semiconductor Corporation and Spansion LLC. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology and electroplating.
Collaborations
Takeguchi has collaborated with esteemed colleagues, including Masahiko Higashi and Takayuki Enda. These partnerships have contributed to the advancement of his research and the successful development of his patents.
Conclusion
Naoki Takeguchi's contributions to electroplating and semiconductor technologies highlight his innovative spirit and dedication to advancing these fields. His patents reflect a commitment to improving processes and enhancing device performance.