This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2021-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021-2025
Title: Naoki Takahashi: Innovator in Film Formation Technology
Introduction
Naoki Takahashi is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of film formation technology, holding 2 patents that showcase his innovative approaches. His work primarily focuses on methods and apparatuses that enhance substrate processing.
Latest Patents
Takahashi's latest patents include a film formation method and a film formation apparatus. The film formation method involves providing a film formation apparatus that includes a substrate support, a target holder, and a magnet unit. This method allows for the formation of a film on a substrate through magnetron sputtering of a target. It also incorporates serial communication monitoring to acquire information on power from a power supply. The magnet unit oscillates in a predetermined direction along the target, adjusting the power supplied to the target holder based on its position.
His second patent, the substrate processing method and apparatus, features a power supply device designed to supply DC power. This device includes a current detection unit with multiple sensors that detect current values across different ranges. The power supply is controlled to maintain a set value based on the detection results, ensuring efficient substrate processing.
Career Highlights
Naoki Takahashi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at this organization has allowed him to develop and refine his innovative technologies, contributing to advancements in film formation and substrate processing.
Collaborations
Takahashi collaborates with notable colleagues, including Yoshinori Yamamoto and Hideomi Hosaka. Their combined expertise fosters a creative environment that drives innovation in their respective fields.
Conclusion
Naoki Takahashi's contributions to film formation technology and substrate processing are noteworthy. His patents reflect a commitment to advancing the industry through innovative methods and apparatuses. His work continues to influence the field, showcasing the importance of creativity and collaboration in technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile