Yokkaichi, Japan

Naoki Sato

This inventor holds 2 USPTO granted patents. Top assignee: Toshiba Memory Corporation. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Sato. Retrieved from https://idiyas.com/inventor/naoki-sato-816pw0nf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2018

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2 patents (USPTO):Explore Patents

Title: **Innovator Spotlight: Naoki Sato**

Introduction

Naoki Sato is a distinguished inventor based in Yokkaichi, Japan, known for his contributions to the field of semiconductor manufacturing. With two patents to his name, Sato has made significant strides in the development of advanced manufacturing methods that enhance the performance and precision of semiconductor devices.

Latest Patents

Sato's patents include a **manufacturing method of photomask** and a **recording medium**. This innovative method outlines a procedure for achieving optimal exposure conditions when forming a resist into a three-dimensional target shape using a photomask. His technique involves several steps, including the correction of the target shape based on the resist’s development characteristics and the simulation of the resist's prediction shape. The process also includes calculating a cost function to minimize errors, allowing for fine adjustments to the photomask pattern.

Another significant patent he holds details a **layout method of mask pattern**, a manufacturing method for semiconductor devices, and an exposure mask. In this approach, Sato divides the layout region of the mask pattern into multiple units and strategically arranges main patterns and sub-patterns. This arrangement is designed to optimize exposure light distribution in the different layout regions, enhancing overall manufacturing efficacy.

Career Highlights

Naoki Sato is currently associated with Toshiba Memory Corporation, where his innovative work has contributed to advancements in semiconductor technology. His experience and expertise in photomask manufacturing reflect his deep understanding of the complexities involved in semiconductor design and production.

Collaborations

Throughout his career, Sato has collaborated with notable colleagues such as Takaki Hashimoto and Satoshi Usui. Their joint efforts have likely played a significant role in the development of cutting-edge technologies and innovations within the semiconductor industry.

Conclusion

Naoki Sato's contributions to the field of semiconductor manufacturing through his innovative patents exemplify the impact of dedicated inventors on technology advancement. His work continues to influence the way semiconductors are designed and produced, paving the way for future innovations in this critical industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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