The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2018
Filed:
Sep. 02, 2016
Applicant:
Toshiba Memory Corporation, Minato-ku, JP;
Inventors:
Masakazu Hamasaki, Yokkaichi, JP;
Yoshihiro Yanai, Yokkaichi, JP;
Michiya Takimoto, Yokkaichi, JP;
Naoki Sato, Yokkaichi, JP;
Satoshi Usui, Nagoya, JP;
Takaki Hashimoto, Yokohama, JP;
Assignee:
TOSHIBA MEMORY CORPORATION, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/36 (2012.01); G06F 17/50 (2006.01); H01L 21/033 (2006.01); H01L 21/027 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01); G06F 17/5081 (2013.01); H01L 21/0274 (2013.01); H01L 21/0338 (2013.01); H01L 21/31144 (2013.01);
Abstract
According to one embodiment, a layout region of a mask pattern is divided into N (N is an integer of 2 or larger) units, a main pattern resolved by exposure light is arranged and sub patterns not resolved by the exposure light are arranged outside the main pattern such that distributions of attenuation amount of the exposure light in the divided layout regions are different.