Saitama, Japan

Naoki Ono

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Materials Silicon Corporation. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Ono. Retrieved from https://idiyas.com/inventor/naoki-ono-96mrioml

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: Naoki Ono: Innovator in Solid-Liquid Interface Simulation

Introduction

Naoki Ono is a distinguished inventor based in Saitama, Japan. He has made significant contributions to the field of materials science, particularly in the simulation of solid-liquid interfaces. His innovative approach aims to enhance the accuracy of computational models in crystal growth processes.

Latest Patents

Naoki Ono holds a patent for a method that simulates the shape of the solid-liquid interface between a single crystal and a molten liquid. This patent outlines a comprehensive process that includes modeling a hot zone in a pulling apparatus, inputting physical property values, and obtaining temperature distributions. The method ultimately aims to align computational results with actual measurements, ensuring precision in the understanding of solid-liquid interactions.

Career Highlights

Ono is currently employed at Mitsubishi Materials Silicon Corporation, where he applies his expertise in materials science. His work focuses on improving the efficiency and accuracy of crystal growth techniques, which are crucial for various industrial applications.

Collaborations

Naoki Ono collaborates with Kounosuke Kitamura, contributing to advancements in their field through shared knowledge and innovative research.

Conclusion

Naoki Ono's work in simulating solid-liquid interfaces represents a significant advancement in materials science. His contributions not only enhance theoretical understanding but also have practical implications in industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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