Yamanashi, Japan

Naoki Noda

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Yamanashi, JP (2004 - 2013)
  • Kawasaki, JP (2014)

Company Filing History:


Years Active: 2004-2014

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3 patents (USPTO):Explore Patents

Title: Naoki Noda: Innovator in Semiconductor Technology

Introduction

Naoki Noda is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of semiconductor technology, holding three patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is titled "Electronic device and fabrication method thereof." This invention involves an electronic device that features a first semiconductor substrate with a bonding projection section, which is projected via an insulation film. A second semiconductor substrate is bonded to the first through conductive bonding material, allowing both substrates to share the same electric potential. Another notable patent is the "Method of bonding semiconductor substrate and MEMS device." This method describes a process of bonding substrates through eutectic bonding, utilizing an aluminum-containing layer and a germanium layer to achieve a strong connection.

Career Highlights

Throughout his career, Naoki Noda has worked with notable companies such as Pioneer Corporation and Pioneer Micro Technology Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Naoki has collaborated with esteemed colleagues, including Toshio Yokouchi and Masahiro Ishimori. Their combined expertise has fostered an environment of innovation and creativity in their projects.

Conclusion

Naoki Noda's work in semiconductor technology exemplifies the spirit of innovation. His patents and collaborations reflect his commitment to advancing the field and contributing to technological progress.

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