Niigata, Japan

Naoki Nagai

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Nagai. Retrieved from https://idiyas.com/inventor/naoki-nagai-aa9mgnwb

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Naoki Nagai: Innovator in Chlorosilane Purification

Introduction

Naoki Nagai is a prominent inventor based in Niigata, Japan. He has made significant contributions to the field of chemical engineering, particularly in the purification of chlorosilanes. His innovative methods have the potential to enhance the quality of chemical products in various industries.

Latest Patents

Nagai holds a patent for a method for purifying chlorosilanes. This invention provides a technique for obtaining high purity chlorosilanes from those containing boron and phosphorus impurities. The method is based on the discovery that solid by-product formation during purification can be mitigated by adding a Lewis base with a masking effect. Examples of suitable Lewis bases include divalent sulfur-containing compounds and alkoxysilanes.

Career Highlights

Nagai is associated with Shin-Etsu Chemical Co., Ltd., a leading company in the chemical industry. His work has focused on improving the efficiency and effectiveness of chemical purification processes. With a patent count of 1 patent, he continues to contribute to advancements in his field.

Collaborations

Nagai has collaborated with notable colleagues, including Takaaki Shimizu and Katsuhiro Uehara. Their combined expertise has fostered innovation and development in chemical processes.

Conclusion

Naoki Nagai's contributions to chlorosilane purification exemplify the impact of innovative thinking in the chemical industry. His work not only addresses current challenges but also paves the way for future advancements in chemical engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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