The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Jul. 07, 2010
Naoki Nagai, Niigata, JP;
Takaaki Shimizu, Niigata, JP;
Katsuhiro Uehara, Niigata, JP;
Tohru Kubota, Niigata, JP;
Naoki Nagai, Niigata, JP;
Takaaki Shimizu, Niigata, JP;
Katsuhiro Uehara, Niigata, JP;
Tohru Kubota, Niigata, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R—S—R' (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R′ is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: RSi(OR′)(wherein R and R′ are each an alkyl group having 1 to 20 carbon atoms).