Location History:
- Niigata, JP (2022)
- Joetsu, JP (2020 - 2024)
Company Filing History:
Years Active: 2020-2025
Title: Naoki Matsuhashi: Innovator in Photomask Technology
Introduction
Naoki Matsuhashi is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of photomask technology, holding a total of 7 patents. His work focuses on enhancing the quality and efficiency of photomasks used in semiconductor manufacturing.
Latest Patents
Matsuhashi's latest patents include innovations such as a photomask blank and a method for producing photomasks. The photomask blank features a substrate and a chromium-containing film, which consists of three distinct layers. The first layer contains oxygen and nitrogen, with specific atomic percentages of chromium, oxygen, and nitrogen, and a thickness of 8 to 20 nm. The second layer is rich in chromium and nitrogen, with a thickness of 40 to 70 nm. The third layer also contains oxygen and nitrogen, maintaining a thickness of 10 nm or less. This design results in a photomask blank that exhibits excellent surface roughness and low resistivity for foreign matter adherence, while also being capable of reading a barcode pattern.
Another notable patent is the phase shift mask blank, which includes a transparent substrate and an etching protection film. This film is composed of materials containing hafnium and oxygen, ensuring a transmittance of not less than 85% for exposure light. The phase shift film, in contact with the etching protection film, is made of silicon and has a thickness of 50 to 90 nm. These innovations are crucial for improving the performance of photomasks in advanced lithography processes.
Career Highlights
Matsuhashi is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise in photomask technology has positioned him as a key player in the field.
Collaborations
Throughout his career, Matsuhashi has collaborated with notable colleagues, including Kouhei Sasamoto and Shohei Mimura. These partnerships have fostered innovation and contributed to the advancement of photomask technologies.
Conclusion
Naoki Matsuhashi's contributions to photomask technology are significant and impactful. His innovative patents and ongoing work at Shin-Etsu Chemical Co., Ltd. continue to shape the future of semiconductor manufacturing.