Naoki Ito is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His innovative work has paved the way for advancements in semiconductor device manufacturing.

Latest Patents

One of Naoki Ito's latest patents involves a semiconductor device manufacturing method. In this method, a polysilicon film is deposited in a trench formed in a silicon element substrate. The polysilicon film in the trench and on the silicon element substrate is anisotropically etched, ensuring that the film remains on the side wall of the trench. The polysilicon film on the side wall is then oxidized to obtain an insulating film, which buries the trench. Simultaneously, an oxidized film is formed on the surface of the silicon element substrate to complete a trench-mold separation area.

Career Highlights

Naoki Ito is currently employed at Fuji Electric Co., Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.

Collaborations

Naoki has collaborated with notable colleagues such as Tsuneo Watanabe and Yoshiyuki Sugahara, contributing to various projects and advancements in their field.

Conclusion

Naoki Ito's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices.

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