Sagamihara, Japan

Naoki Hara

This inventor holds 2 USPTO granted patents and 4 published patent applications. Top assignee: 1Finity Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Hara. Retrieved from https://idiyas.com/inventor/naoki-hara-dr1ybrde

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Naoki Hara: Innovator in Semiconductor Technology

Introduction

Naoki Hara is a prominent inventor based in Sagamihara, Japan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device that enhances performance and efficiency.

Latest Patents

Naoki Hara holds 1 patent for his invention titled "Semiconductor device and method for manufacturing semiconductor device." This patent describes a semiconductor device that includes a substrate, an electron traveling layer, and an electron supply layer. The device features gate, source, and drain electrodes, along with first and second protrusions that extend from the source and drain electrodes, respectively. The design ensures that the volume ratios of these protrusions are maintained at 60% or less, optimizing the device's functionality.

Career Highlights

Hara's career is marked by his dedication to advancing semiconductor technology. His work at 1Finity Inc. has positioned him as a key player in the industry. His innovative approach and technical expertise have garnered attention and respect among his peers.

Collaborations

Naoki Hara collaborates with talented individuals such as Yusuke Kumazaki and Naoya Okamoto. Their combined efforts contribute to the ongoing development of cutting-edge semiconductor solutions.

Conclusion

Naoki Hara's contributions to semiconductor technology exemplify his innovative spirit and commitment to excellence. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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