Tokyo, Japan

Naoki Enjo

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Adeka Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoki Enjo. Retrieved from https://idiyas.com/inventor/naoki-enjo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Naoki Enjo - Innovator in Antistatic Technology

Introduction

Naoki Enjo is an accomplished inventor based in Tokyo, Japan. He is currently employed at Adeka Corporation, where he focuses on developing innovative solutions in the field of antistatic agents. Although he has not yet been granted any patents, his contributions to the industry are noteworthy.

Latest Patent Applications

Naoki Enjo has filed several patent applications, including:

- ANTISTATIC AGENT

- ANTISTATIC COMPOSITION COMPRISING SAME

- ANTISTATIC RESIN COMPOSITION COMPRISING SAME

- MOLDED ARTICLE THEREOF

These applications provide an antistatic agent that can continuously impart an excellent antistatic effect to synthetic resin while maintaining excellent storage stability and productivity. The antistatic agent comprises at least one polymer compound obtained through a specific reaction involving a polyester, a compound with ethyleneoxy groups, and an epoxy compound. The polyester is derived from a reaction between a diol and a dicarboxylic acid, with specific examples including 1,4-butanediol and succinic acid.

Conclusion

Naoki Enjo's work at Adeka Corporation highlights his commitment to advancing antistatic technology, even in the absence of granted patents. His innovative applications demonstrate the potential for significant contributions to the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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