The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2026
Filed:
Dec. 05, 2019
Adeka Corporation, Tokyo, JP;
Naoki Enjo, Tokyo, JP;
Kazukiyo Nomura, Tokyo, JP;
ADEKA CORPORATION, Tokyo, JP;
Abstract
Provided are: an antistatic agent which can continuously impart an excellent antistatic effect to a synthetic resin and has excellent storage stability and productivity (cutting property); an antistatic agent composition containing the same; an antistatic resin composition containing the antistatic agent or the antistatic agent composition; and a molded article thereof. The antistatic agent contains at least one polymer compound (E) which is obtained by a reaction of a polyester (a) obtained by a reaction between a diol (a1) and a dicarboxylic acid (a2), a compound (b) containing at least one ethyleneoxy group and having hydroxy groups at both ends, and an epoxy compound (D) containing two or more epoxy groups. The diol (a1) is at least either of 1,4-butanediol and ethylene glycol, and the dicarboxylic acid (a2) is succinic acid or a dicarboxylic acid mixture containing succinic acid.