Muko, Japan

Naohiro Akiyama

This inventor holds 1 USPTO granted patent. Top assignee: Omron Corporation. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naohiro Akiyama. Retrieved from https://idiyas.com/inventor/naohiro-akiyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Naohiro Akiyama: Innovator in Manufacturing Management Systems

Introduction

Naohiro Akiyama is a notable inventor based in Muko, Japan. He has made significant contributions to the field of manufacturing management systems. His innovative approach has led to the development of a unique management system that enhances the efficiency of manufacturing lines.

Latest Patents

Akiyama holds 1 patent for a management system and management method. This system is designed to optimize manufacturing processes by collecting event information from various facilities. It classifies this information based on its source and content, generating data that visualizes the progression of workpieces according to order information.

Career Highlights

Akiyama is associated with Omron Corporation, where he applies his expertise in developing advanced manufacturing solutions. His work focuses on improving the operational efficiency of manufacturing lines through innovative management techniques.

Collaborations

He has collaborated with notable coworkers, including Minoru Oka and Yoshiaki Kobayashi, to further enhance the capabilities of their projects.

Conclusion

Naohiro Akiyama's contributions to manufacturing management systems exemplify the impact of innovation in the industry. His patent reflects a commitment to improving manufacturing processes, showcasing the importance of effective management in production environments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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