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For the Inventor, By the Inventor

Tokyo, Japan

Naohiko Fujino

This inventor holds 17 USPTO granted patents, primarily in Semiconductor Analysis. Top assignees: Mitsubishi Denki Kabushiki Kaisha, Seiko Instruments Inc, Mitsubishi Electric Corporation. Active years: 1995-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naohiko Fujino. Retrieved from https://idiyas.com/inventor/naohiko-fujino

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17

% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 10

Forward Citations = 200(Granted Patents)


Location History:

  • Amagasaki, JP (1995 - 1999)
  • Hyogo, JP (1997 - 2002)
  • Tokyo, JP (1999 - 2002)

Company Filing History:

goldMedal10 out of 21,351 
 
Mitsubishi Denki Kabushiki Kaisha
 patents
silverMedal2 out of 2,903 
 
Seiko Instruments Inc
 patents
bronzeMedal1 out of 16,618 
 
Mitsubishi Electric Corporation
 patents
4. 5 out of 834,570 
Other
 patents
where one patent can have more than one assignee

Years Active: 1995-2002

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Areas of Expertise:
Surface Analyzing Apparatus
Minute Foreign Substance
Semiconductor Device
Liquid Crystal Display
Silicon Wafer
Thin Film Forming
Optical Scanning
Particle Detection
Cleaning Apparatus
Anti-Vibration Table
Atomic Force Microscope
Manufacturing Methods
17 patents (USPTO):Explore Patents
1. 6388249 - Surface analyzing apparatus (2002-05-14),
2. 6355495 - Method and apparatus for analyzing minute foreign substance, and process for semiconductor elements or liquid crystal elements by use thereof (2002-03-12),
3. 6259093 - Surface analyzing apparatus (2001-07-10),
4. 6255127 - Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same (2001-07-03),
5. 6184519 - Surface analyzing apparatus with anti-vibration table (2001-02-06),
6. 6182675 - Apparatus for recovering impurities from a silicon wafer (2001-02-06),
7. 6124142 - Method for analyzing minute foreign substance elements (2000-09-26),
8. 6110291 - Thin film forming apparatus using laser (2000-08-29),
9. 5907398 - Particle detecting method and system for detecting minute particles on a (1999-05-25),
10. 5877035 - Analyzing method and apparatus for minute foreign substances, and (1999-03-02),
11. 5715052 - Method of detecting the position and the content of fine foreign matter (1998-02-03),
12. 5650614 - Optical scanning system utilizing an atomic force microscope and an (1997-07-22),
13. 5590672 - Semiconductor cleaning apparatus and wafer cassette (1997-01-07),
14. 5568821 - Semiconductor cleaning apparatus and wafer cassette (1996-10-29),
15. 5551459 - Semiconductor cleaning apparatus and wafer cassette (1996-09-03),

Title: Naohiko Fujino: Innovator in Surface Analyzing Technology

Introduction

Naohiko Fujino is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of surface analyzing technology, holding a total of 17 patents. His innovative work has advanced the understanding and analysis of minute foreign substances, particularly in semiconductor and liquid crystal elements.

Latest Patents

One of Fujino's latest patents is a surface analyzing apparatus designed to enhance the precision of surface analysis. This apparatus allows a sample to be mounted on three-dimensional stages through a sample holder. A beam light emitted from a beam light oscillator is applied to the sample surface through a polarizing element that differs from the polarization of the beam light or directly. The apparatus displays an image of foreign matter on the sample surface, which is scattered by the beam light, on a monitor through a CCD camera mounted on an optical microscope. Additionally, Fujino has developed methods for analyzing minute foreign substances and processes for semiconductor elements or liquid crystal elements using this technology.

Career Highlights

Throughout his career, Naohiko Fujino has worked with notable companies, including Mitsubishi Electric Corporation. His work has been instrumental in developing advanced technologies that are widely used in various industries.

Collaborations

Fujino has collaborated with esteemed colleagues such as Masashi Ohmori and Shigeru Wakiyama. Their combined expertise has contributed to the success of various projects and innovations in the field.

Conclusion

Naohiko Fujino's contributions to surface analyzing technology have made a lasting impact on the industry. His innovative patents and collaborations with other experts highlight his role as a leading inventor in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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