Naohiko Fujino

Title: Naohiko Fujino: Innovator in Surface Analyzing Technology

Introduction

Naohiko Fujino is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of surface analyzing technology, holding a total of 17 patents. His innovative work has advanced the understanding and analysis of minute foreign substances, particularly in semiconductor and liquid crystal elements.

Latest Patents

One of Fujino's latest patents is a surface analyzing apparatus designed to enhance the precision of surface analysis. This apparatus allows a sample to be mounted on three-dimensional stages through a sample holder. A beam light emitted from a beam light oscillator is applied to the sample surface through a polarizing element that differs from the polarization of the beam light or directly. The apparatus displays an image of foreign matter on the sample surface, which is scattered by the beam light, on a monitor through a CCD camera mounted on an optical microscope. Additionally, Fujino has developed methods for analyzing minute foreign substances and processes for semiconductor elements or liquid crystal elements using this technology.

Career Highlights

Throughout his career, Naohiko Fujino has worked with notable companies, including Mitsubishi Electric Corporation. His work has been instrumental in developing advanced technologies that are widely used in various industries.

Collaborations

Fujino has collaborated with esteemed colleagues such as Masashi Ohmori and Shigeru Wakiyama. Their combined expertise has contributed to the success of various projects and innovations in the field.

Conclusion

Naohiko Fujino's contributions to surface analyzing technology have made a lasting impact on the industry. His innovative patents and collaborations with other experts highlight his role as a leading inventor in this field.