Company Filing History:
Years Active: 1996-2002
Title: **The Innovative Mind of Naoharu Nishio**
Introduction
Naoharu Nishio, an accomplished inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. With three patents to his name, his work focuses on improving the efficiency and performance of semiconductor devices.
Latest Patents
Nishio's latest patents showcase his innovative approach to semiconductor fabrication. One of his notable inventions involves the **thermal processing of semiconductor devices**. This process describes how a semiconductor substrate undergoes ion implantation with high energy, followed by an annealing stage where the substrate is heated to temperatures ranging from 1,000°C to 1,200°C at a ramp-up rate of at least 200°C/sec. This method results in semiconductor devices with smaller leakage currents and reduced variations, even when high-energy ion implantation is conducted.
Another significant patent is for the **fabrication process of semiconductor devices**. This invention details the creation of an element separation region and a gate insulation layer on the surface of a silicon layer within a semiconductor substrate. The process includes forming a gate electrode wiring and an insulation layer spacer, introducing diffusion layers for source and drain regions, and strategically creating an uneven surface for improved conductivity. These methodologies enable the formation of a MOS transistor with a salicide structure without increasing sheet resistance during high-temperature annealing.
Career Highlights
Nishio's work at NEC Corporation has positioned him as a key figure in the semiconductor industry. His focus on innovative processes and techniques has made a marked impact on the efficiency of device fabrication. The three patents registered under his name demonstrate his commitment to advancing semiconductor technology.
Collaborations
Throughout his career, Naoharu Nishio has collaborated with talented individuals such as Michiko Yamanaka and Toshiya Hayashi. Their cooperative efforts within NEC Corporation have fostered an environment of innovation, leading to groundbreaking advancements in semiconductor designs and processes.
Conclusion
Naoharu Nishio stands out as a pivotal inventor in the semiconductor field. His patents highlight his expertise and dedication to enhancing the performance of semiconductor devices. With ongoing collaborations and a promise of future innovations, Nishio continues to be an inspiring figure in technological advancements.