This inventor holds 2 USPTO granted patents. Top assignees: Showa Denko Kabushiki Kaisha, Nikkan Industries Co., Ltd., Nippon Electric Co., Ltd.. Active years: 1976-1985.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tokyo, JA (1976)
- Machida, JP (1985)
Company Filing History:

Years Active: 1976-1985
Title: Naoaki Oishi: Innovator in Printed Circuit Substrates and Electrolytic Capacitors
Introduction
Naoaki Oishi is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the fields of printed circuit substrates and electrolytic capacitors. With a total of 2 patents, Oishi's work showcases his innovative approach to electrical engineering.
Latest Patents
Oishi's latest patents include a substrate for printed circuits that exhibits excellent electrical insulating properties, heat dissipating capabilities, and heat resistance. This invention involves a metallic plate with a synthetic resin layer containing an inorganic filler, a heat-resistant resin film, and additional synthetic resin layers laminated on the plate. His other patent focuses on a process for making electrolytic capacitor anodes by sintering metal powder into a continuum of anode bodies, which are then cut into individual units.
Career Highlights
Throughout his career, Oishi has worked with notable companies such as Showa Denko and Nikkan Industries. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.
Collaborations
Oishi has collaborated with esteemed colleagues, including Noriyuki Shimizu and Takashi Shoji. Their combined expertise has further advanced the development of technologies in their respective fields.
Conclusion
Naoaki Oishi's contributions to the fields of printed circuit substrates and electrolytic capacitors highlight his innovative spirit and dedication to engineering. His patents reflect a commitment to enhancing electrical performance and efficiency in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile