Dallas, TX, United States of America

Nandakumar Mahalingam


Average Co-Inventor Count = 1.6

ph-index = 1


Location History:

  • Dallas, TX (US) (2011)
  • Richardson, TX (US) (2022)

Company Filing History:


Years Active: 2011-2022

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2 patents (USPTO):Explore Patents

Title: Innovations of Nandakumar Mahalingam

Introduction

Nandakumar Mahalingam is a notable inventor based in Dallas, TX (US). He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to integrated circuit design.

Latest Patents

His latest patents include the "Bent Gate Logic Device" and "Semiconductor Doping with Reduced Gate Edge Diode Leakage." The Bent Gate Logic Device patent describes an integrated circuit that features a first and second active area with specific conductivity types, along with a unique bent-gate transistor design. This design includes a first gate electrode that crosses the first active area at an angle between 45° and 80°, enhancing the performance of the transistor. The second patent focuses on semiconductor doping techniques that improve the control of source and drain extension region dopant profiles while minimizing gate edge diode leakage. This innovation utilizes carbon as a diffusion suppressant, allowing for better doping without compromising the integrity of the device.

Career Highlights

Nandakumar works at Texas Instruments Corporation, a leading company in semiconductor design and manufacturing. His work has contributed to advancements in integrated circuit technology, making him a valuable asset to his team and the industry.

Collaborations

He collaborates with talented coworkers such as Puneet Kohli and Manoj Mehrotra, who share his commitment to innovation and excellence in semiconductor technology.

Conclusion

Nandakumar Mahalingam's contributions to the field of semiconductor technology through his patents and work at Texas Instruments Corporation highlight his role as a significant inventor. His innovative designs and techniques continue to influence the industry and pave the way for future advancements.

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