Company Filing History:
Years Active: 2001-2005
Title: **Naftall E Lustig: A Leading Innovator in Advanced Metallization Structures**
Introduction
Naftall E Lustig is a prominent inventor based in Croton on Hudson, NY, known for his significant contributions to the field of semiconductor technology. With an impressive portfolio consisting of three patents, he has become a key figure in the advancement of metallization structures crucial for modern electronic devices.
Latest Patents
One of Lustig's latest patents is for a "Bilayer HDP CVD/PE CVD cap in advanced BEOL interconnect structures and method thereof." This invention pertains to an advanced back-end-of-line (BEOL) metallization structure that features a bilayer diffusion barrier or cap. The first cap layer is ideally formed from a dielectric material deposited using a high-density plasma chemical vapor deposition (HDP CVD) process, while the second cap layer utilizes a dielectric material deposited via a plasma-enhanced chemical vapor deposition (PE CVD) process. This innovative structure is particularly valuable for interconnects that incorporate low-k dielectric materials for the inter-layer dielectric (ILD) and utilize copper as conductors.
Career Highlights
Throughout his career, Lustig has worked for prestigious companies including the International Business Machines Corporation (IBM) and Infineon Technologies AG. His experiences at these leading technology firms have further honed his expertise in semiconductor fabrication and materials science, enabling him to develop cutting-edge inventions that address today's technological challenges.
Collaborations
Lustig has collaborated with notable colleagues such as Tze-Chiang Chen and Brett H Engel. Together, they have contributed to advancing the field of semiconductor technology, focusing on developing innovative solutions to enhance the performance and reliability of electronic components.
Conclusion
Naftall E Lustig's contributions to the field of metallization structures and his dedication to innovation have solidified his status as a notable inventor. Through his patents and collaborative efforts, he continues to make significant strides in semiconductor technology, paving the way for future advancements in the industry.
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