Suwon-si, South Korea

Naeun Lee

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naeun Lee. Retrieved from https://idiyas.com/inventor/naeun-lee-ke6b127a

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Naeun Lee: Innovator in Plasma-Resistant Coating Technologies

Introduction

Naeun Lee is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of plasma-resistant coatings, showcasing his expertise through innovative patent applications. His work is particularly relevant in industries that require advanced materials capable of withstanding harsh environments.

Latest Patents

Naeun Lee holds a patent for a method of densifying a plasma-resistant coating layer. This method involves applying a fluorocarbon material that includes CHF to a surface of a base material. The process forms a fluorocarbon coated base material, followed by projecting a pulsed laser beam onto the coated surface. This results in a coating layer where yttrium (Y) and fluorine (F) are bonded together, achieved through a laser sintering process. He has 1 patent to his name.

Career Highlights

Naeun Lee is currently employed at Samsung Electronics Ltd., where he continues to develop innovative solutions in material science. His work has been instrumental in advancing the capabilities of plasma-resistant coatings, which are essential for various high-tech applications.

Collaborations

Naeun has collaborated with notable colleagues, including Shinhwa Jung and Sanghee Lee. Their combined efforts contribute to the ongoing research and development in the field of advanced materials.

Conclusion

Naeun Lee's contributions to plasma-resistant coating technologies highlight his role as an influential inventor in the industry. His innovative methods and collaborations continue to push the boundaries of material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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