The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2026
Filed:
Mar. 11, 2025
Samsung Electronics Co., Ltd., Suwon-si, KR;
Naeun Lee, Suwon-si, KR;
Shinhwa Jung, Suwon-si, KR;
Sanghee Lee, Suwon-si, KR;
Wonhee Lee, Suwon-si, KR;
Donghyun Jang, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A method of densifying a plasma-resistant coating layer includes applying a fluorocarbon material including CHF(where x and z are each independently a real number greater than 0, and y is an integer greater than or equal to 0) to a surface of a base material having a surface including YO(where a and b are each independently a real number greater than 0) to form a fluorocarbon coated base material, and projecting a pulsed laser beam onto a region of the fluorocarbon coated base material to form a coating layer over the base material, in which coating layer yttrium (Y) and fluorine (F) are bonded together, wherein the coating layer is formed by a laser sintering process occurring by projecting the pulsed laser beam.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile