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Title: Na Bi: Innovator in Mask Technology
Introduction
Na Bi is a prominent inventor based in Beijing, China. He has made significant contributions to the field of mask technology, particularly in the manufacturing methods for masks used in electronic displays. With a total of 3 patents to his name, Na Bi continues to push the boundaries of innovation in his field.
Latest Patents
Na Bi's latest patents include a mask and a manufacturing method for the mask. This invention addresses the issue of color mixing that can occur during the evaporation process when forming patterns on light-emitting substrates. The mask is designed to cover a motherboard and is created through a multi-division exposure procedure. It features a metal frame, a support mask, and fine metal mask strips with multiple openings for the evaporation of a light-emitting film for sub-pixels. Additionally, he has developed a mask assembly that includes a display region and welding regions, with specific thicknesses to enhance functionality.
Career Highlights
Throughout his career, Na Bi has worked with notable companies such as BOE Technology Group Co., Ltd. and Chengdu BOE Optoelectronics Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in display technology.
Collaborations
Na Bi has collaborated with several professionals in his field, including Kui Wang and Longhui Xue. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Na Bi's work in mask technology exemplifies the spirit of innovation and dedication to improving electronic display manufacturing processes. His contributions continue to influence the industry and pave the way for future advancements.