The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 2025
Filed:
Oct. 22, 2021
Boe Technology Group Co., Ltd., Beijing, CN;
Beijing BOE Technology Group Co., Ltd., Beijing, CN;
Abstract
Disclosed are a mask and a manufacturing method for the mask, aiming to solve the problem in the prior art of the easy occurrence of color mixing due to the inaccurate position of evaporation when a pattern of a light-emitting substrate is formed by means of a mask. The mask for covering a mother board, which is formed by a multi-division exposure procedure and thus has a substrate invalid region that cannot be exposed due to the multi-division exposure procedure, comprises: a metal frame; a support mask located on one side of the metal frame; at least one fine metal mask strip, which is located on the side of the support mask that faces away from the metal frame, and is provided with multiple openings for the evaporation of a light-emitting film for sub-pixels in the mother board; and a support plate located between the metal frame and the fine metal mask for covering the substrate invalid region, with the thickness of the support plate being greater than that of the support mask.