Company Filing History:
Years Active: 2007-2008
Title: N Jon Metivier: Innovator in Photosensitive Resin Compositions
Introduction
N Jon Metivier is a notable inventor based in Billerica, MA (US). He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. With a total of 3 patents to his name, Metivier continues to push the boundaries of innovation in his industry.
Latest Patents
Among his latest patents, Metivier has developed a photosensitive resin composition that includes a unique pretreatment composition. This composition features various alkyl, alkenyl, alkynyl, alkoxy groups, and halogens, showcasing his expertise in formulating advanced materials. His work emphasizes the importance of precise chemical structures in enhancing the performance of photosensitive resins.
Career Highlights
Metivier is currently employed at Fujifilm Electronic Materials U.S.A., Inc., where he applies his knowledge and skills to advance the company's product offerings. His role involves extensive research and development, focusing on innovative solutions that meet the evolving needs of the electronics industry.
Collaborations
Throughout his career, Metivier has collaborated with talented professionals, including Ahmad A Naiini and David B Powell. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
N Jon Metivier stands out as a dedicated inventor whose work in photosensitive resin compositions has made a significant impact in his field. His contributions continue to inspire innovation and drive advancements in materials science.