Fujifilm Electronic Materials U.s.a., Inc.

N Jon Metivier

Ahmad A Naiini

David B Powell

Richard Hopla

Il'ya Rushkin

Donald F Perry

A photosensitive resin composition comprising: 

Photosensitive resin compositions

A pretreatment composition of: each Ris independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each Ris independently H, SH, CH, CH, and a linear or branched C-Calkyl group containing a thiol group; and wherein Vand Vare independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can=0 only when Y&#x2550; n is an integer from 1 to 5; p is an integer of from 1 to 4, and each Ris defined as above;

Pretreatment compositions

A photosensitive resin composition comprising: each Ris selected H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each Ris selected from H, SH, CH, CH, and a linear or branched C&#x2013;Calkyl group containing a thiol group; p is an integer of from 1 to 4, and wherein Vand Vare independently selected from the group consisting of wherein, m is independently an integer from 0 to 4 with the proviso that m=0 only when Y= n is an integer from 1 to 5; and each Ris defined as above; and

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Billerica, MA, United States of America

N Jon Metivier