Myoung Won Suh

Title: Myoung Won Suh: Innovator in CMP Slurry Technology

Introduction

Myoung Won Suh is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) through his innovative patent. His work focuses on enhancing the properties of CMP slurries, which are essential in the semiconductor manufacturing process.

Latest Patents

Myoung Won Suh holds a patent for a CMP slurry, which includes a preparation method and a method of polishing substrates using the slurry. The patent describes a CMP slurry that comprises polishing particles made from organically modified colloidal silica. The preparation method involves several steps, including the synthesis of polishing particles using a sol-gel process. This innovation allows for the creation of a slurry with excellent polishing properties, ensuring a desired CMP removal rate while minimizing scratches on substrates.

Career Highlights

Throughout his career, Myoung Won Suh has worked with various companies, including K.C. Tech Co., Ltd. and Iucf-hyu. His experience in these organizations has contributed to his expertise in CMP technology and the development of advanced polishing solutions.

Collaborations

Myoung Won Suh has collaborated with notable colleagues in the field, including Un Gyu Paik and Jea Gun Park. These collaborations have further enriched his research and development efforts in CMP slurry technology.

Conclusion

Myoung Won Suh's contributions to CMP slurry technology demonstrate his innovative spirit and commitment to advancing the semiconductor industry. His patent reflects a significant step forward in improving polishing processes, showcasing his expertise and dedication to innovation.