Incheon, South Korea

Myong Whan Park

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Ymt Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Myong Whan Park. Retrieved from https://idiyas.com/inventor/myong-whan-park

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Myong Whan Park: Innovator in Plated Laminate Technology

Introduction

Myong Whan Park is a notable inventor based in Incheon, South Korea. He has made significant contributions to the field of printed circuit board technology. His innovative work focuses on enhancing the adhesion and quality of laminates used in electronic applications.

Latest Patents

Myong Whan Park holds a patent for a plating lamination technology that provides a highly adhesive inner layer of a printed circuit board. This technology is effective in creating an electroless plated laminate, which includes a non-etched or low-roughness pretreated laminate or a low-roughness copper foil. His patent is crucial for improving the performance and reliability of printed circuit boards.

Career Highlights

Park is associated with YMT Co., Ltd., where he applies his expertise in laminate technology. His work has been instrumental in advancing the capabilities of printed circuit boards, making them more efficient and reliable for various electronic applications.

Collaborations

He has collaborated with notable colleagues, including Sung Wook Chun and Bo Mook Chung, to further enhance the development of innovative technologies in the field.

Conclusion

Myong Whan Park's contributions to plating lamination technology have made a significant impact on the printed circuit board industry. His innovative approach continues to influence advancements in electronic manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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