This inventor holds 8 USPTO granted patents and 1 EPO patent. Top assignees: Ebara Corporation, Other. Active years: 2001-2017.
Location History:
- Kanagawa-ken, JP (2001)
- Yokohama, JP (2002 - 2003)
- Tokyo, JP (2002 - 2017)
Company Filing History:
7 out of 2,573 
1 out of 834,411 Years Active: 2001-2017
Title: Mutsumi Tanikawa: Innovator in Polishing Pad Technology
Introduction
Mutsumi Tanikawa is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polishing pad technology, holding a total of 8 patents. His innovative methods have advanced the efficiency and effectiveness of polishing processes used in various industries.
Latest Patents
One of Tanikawa's latest patents is a method and apparatus for conditioning a polishing pad. This method is designed for use on a polishing table, specifically for polishing a thin film formed on a substrate's surface. The conditioning process involves bringing a dresser into contact with the polishing pad and moving the dresser between the central part and the outer circumferential part of the pad. Notably, the moving speed of the dresser in a predetermined area is higher than the standard moving speed, enhancing the conditioning process.
Career Highlights
Throughout his career, Mutsumi Tanikawa has worked with prominent companies, including Ebara Corporation. His work has focused on improving polishing techniques, which are crucial in semiconductor manufacturing and other precision industries.
Collaborations
Tanikawa has collaborated with several professionals in his field, including Kiyotaka Kawashima and Takahiro Shimano. These collaborations have contributed to the development of innovative solutions in polishing technology.
Conclusion
Mutsumi Tanikawa's contributions to polishing pad technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in polishing processes, showcasing the importance of innovation in technology.