Tokyo, Japan

Mutsuaki Murakami

This inventor holds 33 USPTO granted patents, primarily in Electrophotography Materials. Top assignees: Matsushita Electric Industrial Co., Ltd., Research Development Corporation of Japan, Hodogaya Chemical Co., Ltd.. Active years: 1976-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mutsuaki Murakami. Retrieved from https://idiyas.com/inventor/mutsuaki-murakami-7yanrjjc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 97.0

Average Co-Inventor Count = 2.4

ph-index = 13

Forward Citations = 540(Granted Patents)


Location History:

  • Kawasaki, JA (1976)
  • Kawasaki, JP (1979 - 1988)
  • Tokyo, JP (1989 - 1998)
  • Machida, JP (1988 - 2004)

Company Filing History:


Years Active: 1976-2004

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Areas of Expertise:
Laminated Capacitors
Electrophotographic Element
Graphite Films
Photosensitive Materials
Organic Photoconductive Material
Acoustic Diaphragm
Conductive Pyrolytic Product
Electroacoustic Diaphragm
Ink Jet Recording Sheet
Graphite Intercalation Compound
Organic Heat-Sensitive Semiconductive Materials
33 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Mutsuaki Murakami in Capacitor Technology**

Introduction

Mutsuaki Murakami, an influential inventor based in Tokyo, Japan, has made significant strides in the field of capacitor technology. With an impressive portfolio of 33 patents, his work showcases innovation that pushes the boundaries of electrical engineering and materials science.

Latest Patents

Among his latest contributions is the patent for a "Method of manufacturing laminated capacitors." This method involves creating a dielectric from organic polymer or a composite dielectric combining organic polymer with a conductive metal oxide. The innovative process includes forming an insulating layer on a conductor, followed by the formation of an electrode on the dielectric layer, ultimately leading to the completion of the capacitive element. This development allows for the lamination of multiple capacitor elements that bond to outside connection terminals, enhancing the efficacy and efficiency of capacitor design.

Another significant patent is for a "Capacitor and its manufacturing method." This invention leverages unique materials, such as polyimide and specific organic high polymers that contain carboxylic radicals, which are formed on surface-roughened conductors. The presence of a conductive high polymer formed by chemical oxidation-polymerization extends the capabilities of these capacitors, making them robust under mechanical stress and applicable for pressure during lamination. As a result, multiple layers of these capacitor elements can be laminated together to produce capacitors with a large capacitance value, reduced equivalent series resistance, minimal leakage current, and excellent frequency characteristics.

Career Highlights

Mutsuaki Murakami's career features positions in prominent organizations such as Matsushita Electric Industrial Co., Ltd. and the Research Development Corporation of Japan. His time in these organizations helped propel innovations in capacitor technology, contributing to the advancement of modern electronics.

Collaborations

Murakami has worked alongside notable colleagues, including Susumu Yoshimura and Kazuhiro Watanabe. Their collaborative efforts in research and development have been instrumental in addressing the complexities of modern capacitor design and manufacturing processes.

Conclusion

Mutsuaki Murakami stands out as a prolific inventor whose work in laminated capacitors has paved the way for advancements in electrical component technology. Through his innovative methods and collaborative spirit, he has not only influenced his field but has also set a precedent for future inventions in capacitor design. His contributions continue to resonate in technology, showcasing the importance of innovation in pushing the boundaries of what is possible in electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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