Company Filing History:
3 out of 2,714 
2 out of 670 Years Active: 1980-1989
Title: Murrae J Bowden: A Pioneer in Silicon-Containing Polymers
Introduction
Murrae J Bowden, an innovative inventor based in Summit, NJ, has made significant contributions in the field of material science, specifically in the development of silicon-containing polymers. With a total of five patents to her name, Bowden has established herself as a key figure in the realm of resist materials for lithography.
Latest Patents
Among her latest patents, Bowden has developed a sensitive deep ultraviolet radiation resist. This innovative material is obtained by brominating poly(1-trimethylsilylpropyne), allowing for the creation of positive patterned layers. The process involves coating a substrate with the polymer, irradiating it with ultraviolet radiation, and then baking and developing the irradiated portions. Another notable patent by Bowden relates to electron beam-sensitive positive resists, specifically poly(alkenyltrialkylsilane sulfone)s. These resists are particularly significant for use in a two-layer resist system, demonstrating high sensitivity, excellent resolution characteristics, and remarkable resistance to oxygen reactive-ion etching. The preparation of these innovative resists involves the polymerization of an .omega.-alkenyltrimethylsilane with sulfur dioxide, with or without a solubilizing olefinic compound.
Career Highlights
Bowden has had an impressive career, having worked with renowned organizations like Bell Telephone Laboratories and Bell Communications Research, Inc. Her time at these institutions has allowed her to leverage her expertise and contribute to the advancement of technologies related to photolithography and polymer science.
Collaborations
Throughout her career, Bowden has collaborated with distinguished colleagues, including Larry F Thompson and Eugene D Feit. These partnerships have fostered an environment of innovation and contributed to the successful development of her patented technologies.
Conclusion
Murrae J Bowden continues to be a prominent force in the field of silicon-containing polymers. Her groundbreaking patents and esteemed collaborations underscore her contributions to advancements in resist materials for lithography. With her innovative spirit, Bowden remains a significant player in the ongoing evolution of material science.