Tokyo, Japan

Munetoshi Irisawa


 

Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2003-2021

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7 patents (USPTO):Explore Patents

Title: Munetoshi Irisawa: Innovator in Photosensitive Resin Technology

Introduction

Munetoshi Irisawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photosensitive resin technology, holding a total of 7 patents. His work focuses on developing innovative materials and methods that enhance the efficiency and effectiveness of etching and plating processes.

Latest Patents

Irisawa's latest patents include a photosensitive resin composition, an etching method, and a plating method. The photosensitive resin composition consists of an alkali-soluble resin, a photopolymerization initiator, and an acrylate monomer. It may also include a methacrylate monomer. The composition is designed to optimize the performance of the resin in various applications. Additionally, he has developed an etching process that utilizes a photosensitive resin layer and an etching solution containing hydrofluoric acid or ammonium fluoride. This innovative approach improves the precision and quality of the etching treatment.

Career Highlights

Throughout his career, Munetoshi Irisawa has worked with notable companies such as Mitsubishi Paper Mills Limited and Shinko Electric Industries Co., Ltd. His experience in these organizations has allowed him to refine his expertise in materials science and engineering, contributing to his success as an inventor.

Collaborations

Irisawa has collaborated with esteemed colleagues, including Yasuo Kaneda and Yuji Toyoda. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies in the field of photosensitive resins.

Conclusion

Munetoshi Irisawa's innovative work in photosensitive resin technology has made a lasting impact on the industry. His patents and collaborations reflect his commitment to advancing the field and improving manufacturing processes. His contributions continue to influence the development of new materials and methods in etching and plating applications.

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