Nagoya, Japan

Muneo Tamura


Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 66(Granted Patents)


Company Filing History:


Years Active: 2009-2011

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8 patents (USPTO):Explore Patents

Title: Muneo Tamura: Innovator in Laser Processing Technology

Introduction

Muneo Tamura is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of laser processing technology, holding a total of 8 patents. His innovative work has advanced methods and apparatuses that are crucial for semiconductor manufacturing.

Latest Patents

Tamura's latest patents include a laser processing apparatus and a dicing method for semiconductor substrates. The laser processing apparatus features a single laser light source that emits laser beams with two different wavelengths. This technology allows for the gradual adjustment of focusing points within a wafer, enabling the formation of multiple modifying region groups. These groups can be separated, adjoined, or overlapped along a predetermined cut line, enhancing the precision of the laser processing. The dicing method involves creating a reforming layer in the substrate through laser irradiation, followed by the formation of a groove along a cutting line. This method ensures that the substrate can be cut effectively at the reforming layer, optimizing the dicing process.

Career Highlights

Muneo Tamura is currently employed at Denso Corporation, where he continues to innovate in the field of laser technology. His work has not only contributed to the company's success but has also positioned him as a key figure in the semiconductor industry.

Collaborations

Tamura has collaborated with notable colleagues such as Tetsuo Fujii and Kazuhiko Sugiura. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Muneo Tamura's contributions to laser processing technology have made a significant impact on the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.

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