Okazaki, Japan

Muneo Sugiura

This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Tokai Optical Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Muneo Sugiura. Retrieved from https://idiyas.com/inventor/muneo-sugiura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Muneo Sugiura: Innovator in Optical Product Technology

Introduction

Muneo Sugiura is a notable inventor based in Okazaki, Japan. He has made significant contributions to the field of optical products, particularly in the area of bending prediction methods. His innovative approach has led to advancements that benefit the optical industry.

Latest Patents

Muneo Sugiura holds a patent for a "Method and program for predicting bending in optical products." This invention involves a computer-based method that predicts the bending of a substrate with a film. The method utilizes various fitting parameters optimized under different coating conditions, ensuring accuracy in predicting bending.

Career Highlights

Sugiura is associated with Tokai Optical Co., Ltd., where he applies his expertise in optical technology. His work has been instrumental in enhancing the performance and reliability of optical products.

Collaborations

Muneo Sugiura has collaborated with notable colleagues, including Takuro Yoshida and Koichi Tamura. Their combined efforts contribute to the innovative environment at Tokai Optical Co., Ltd.

Conclusion

Muneo Sugiura's contributions to optical product technology through his patented methods demonstrate his commitment to innovation. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…