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For the Inventor, By the Inventor

San Jose, CA, United States of America

Mukul Kelkar

This inventor holds 5 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2000-2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mukul Kelkar. Retrieved from https://idiyas.com/inventor/mukul-kelkar-8985tmc6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5

% Patents Active = 100.0

Average Co-Inventor Count = 4.5

ph-index = 5

Forward Citations = 327(Granted Patents)


Company Filing History:

goldMedal5 out of 14,454 
 
Applied Materials, Inc.
 patents

Years Active: 2000-2002

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5 patents (USPTO):Explore Patents
1. 6361707 - Apparatus and methods for upgraded substrate processing system with microwave plasma source (2002-03-26),
2. 6230652 - Apparatus and methods for upgraded substrate processing system with microwave plasma source (2001-05-15),
3. 6079426 - Method and apparatus for determining the endpoint in a plasma cleaning (2000-06-27),
4. 6045618 - Microwave apparatus for in-situ vacuum line cleaning for substrate (2000-04-04),
5. 6039834 - Apparatus and methods for upgraded substrate processing system with (2000-03-21),

Title: Innovations by Mukul Kelkar in Substrate Processing Systems

Introduction

Mukul Kelkar is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of substrate processing systems, holding a total of 5 patents. His work focuses on enhancing the efficiency and effectiveness of chemical vapor deposition (CVD) systems.

Latest Patents

One of Mukul Kelkar's latest patents is titled "Apparatus and methods for upgraded substrate processing system with microwave plasma source." This invention provides an upgraded CVD system that efficiently cleans a chamber using a plasma. The system allows for etching or depositing layers onto substrates. A key feature of this invention is the easily removable and cost-effective microwave plasma source, which can be retrofitted to existing CVD apparatus. The remote microwave plasma source operates without the need for liquid-cooling the plasma applicator tube, making it a practical solution for improving CVD systems.

Career Highlights

Mukul Kelkar is currently employed at Applied Materials, Inc., where he continues to innovate in the field of substrate processing. His work has been instrumental in advancing technologies that enhance manufacturing processes in various industries.

Collaborations

Mukul has collaborated with notable colleagues, including Tsutomu Tanaka and David Wingto Cheung. These partnerships have contributed to the development of cutting-edge technologies in substrate processing.

Conclusion

Mukul Kelkar's contributions to substrate processing systems demonstrate his commitment to innovation and efficiency. His patents reflect a deep understanding of the challenges in the field and provide practical solutions for enhancing CVD systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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