Saitama, Japan

Motoya Shimazu

This inventor holds 5 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignees: Rohm & Haas Electronic Materials LLC, Shipley Company LLC. Active years: 2005-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Motoya Shimazu. Retrieved from https://idiyas.com/inventor/motoya-shimazu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2005-2016

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5 patents (USPTO):Explore Patents

Title: Motoya Shimazu: Innovator in Electroplating Solutions

Introduction

Motoya Shimazu is a notable inventor based in Saitama, Japan. He has made significant contributions to the field of electroplating, particularly with tin and tin alloy solutions. With a total of 5 patents to his name, Shimazu's work has had a considerable impact on the industry.

Latest Patents

Among his latest innovations is a tin or tin alloy electroplating solution. This solution features an additive derived from the reaction product of glutaraldehyde and hydrocarbon compounds containing a hydroxyl group, along with amine compounds. This innovative approach enhances the effectiveness of tin or tin alloy plating solutions.

Career Highlights

Throughout his career, Motoya Shimazu has worked with prominent companies such as Rohm & Haas Electronic Materials and Shipley Company. His experience in these organizations has allowed him to refine his expertise in electroplating technologies.

Collaborations

Shimazu has collaborated with notable colleagues, including Yasuo Ohta and Makoto Kondo. These partnerships have contributed to the advancement of his research and innovations in the field.

Conclusion

Motoya Shimazu's contributions to electroplating solutions exemplify his dedication to innovation and excellence. His patents and collaborations reflect a commitment to advancing technology in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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