Location History:
- Fujisawa, JP (2002)
- Tokyo, JP (2013 - 2014)
Company Filing History:
Years Active: 2002-2014
Title: Motohiro Niijima: Innovator in Polishing Technology
Introduction
Motohiro Niijima is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of polishing technology, particularly in the semiconductor industry. With a total of 3 patents to his name, Niijima's work has advanced the methods and apparatus used for polishing substrates.
Latest Patents
Niijima's latest patents include a polishing apparatus and a polishing method. The polishing apparatus is designed for polishing and planarizing substrates, such as semiconductor wafers, which have conductive films like copper or tungsten layers. This apparatus features a polishing table with a polishing surface, a motor for rotation, and a top ring that holds and presses the substrate against the polishing surface. Additionally, it includes a film thickness measuring sensor for scanning the substrate's surface and a computing device that processes the sensor's signals to compute the film thickness.
The polishing method involves pressing the substrate against a rotating polishing surface. During the process, an eddy current sensor scans the substrate's surface to monitor for any damage. The output from this sensor is crucial for detecting substrate damage and determining the polishing end point. After identifying the end point, further monitoring is conducted to detect any film left on the substrate.
Career Highlights
Throughout his career, Motohiro Niijima has worked with notable companies, including Ebara Corporation and Toshiba Corporation. His experience in these organizations has contributed to his expertise in polishing technology and innovation.
Collaborations
Niijima has collaborated with several professionals in his field, including Taro Takahashi and Mitsuo Tada. These collaborations have likely enriched his work and led to advancements in polishing methods and apparatus.
Conclusion
Motohiro Niijima is a key figure in the development of polishing technology for semiconductor applications. His innovative patents and career achievements reflect his dedication to advancing this critical area of technology.