Santa Clara, CA, United States of America

Moshe Sarfaty

This inventor holds 2 USPTO granted patents. Top assignee: Wisconsin Alumni Research Foundation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Moshe Sarfaty. Retrieved from https://idiyas.com/inventor/moshe-sarfaty-77utul3c

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 35(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2000)
  • Madison, WI (US) (2000)

Company Filing History:


Years Active: 2000

Loading Chart...
2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Moshe Sarfaty

Introduction

Moshe Sarfaty is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of plasma technology, holding 2 patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is the Electro-optical plasma probe. This advanced device enables simultaneous localized electrostatic measurements and optical emission spectroscopy. The probe features a support arm with an elongated section and a bend section, at the end of which is an electrical probe element composed of back-to-back charge collection plates. These plates are separated by an insulating spacer, allowing for precise measurements of electron density, Electron Energy Distribution Function, and ion flow. The probe can be maneuvered around a plasma confinement chamber, providing spatially localized measurements of plasma characteristics at various positions within the chamber.

Another significant patent is the wall deposition thickness sensor for plasma processing chambers. This device measures polymer build-up on plasma chamber walls by utilizing a cooled window where a film may form. Light passing through the window is measured using interferometric techniques to determine changes in film thickness, indicating when cleaning is necessary and the success of cleaning operations. A sapphire window is employed to facilitate air cooling and reduce etching by the plasma, while a fiber optic cable communicates the light between the window and measurement electronics.

Career Highlights

Moshe Sarfaty is associated with the Wisconsin Alumni Research Foundation, where he continues to develop innovative technologies that advance the field of plasma research. His work has had a significant impact on the efficiency and effectiveness of plasma processing techniques.

Collaborations

Throughout his career, Sarfaty has collaborated with esteemed colleagues, including Noah H Hershkowitz and Anthony K Quick. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the advancement of technology.

Conclusion

Moshe Sarfaty's contributions to plasma technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative devices are paving the way for advancements in plasma processing and measurement techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…