The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2000
Filed:
Oct. 29, 1998
Applicant:
Inventors:
Anthony K Quick, Madison, WI (US);
Moshe Sarfaty, Madison, WI (US);
Noah H Hershkowitz, Madison, WI (US);
Perry W Sandstrom, Madison, WI (US);
Assignee:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356357 ; 356359 ; 356382 ;
Abstract
A device for measuring polymer build-up on plasma chamber walls provides a cooled window on which a film may form. Light passing through the window outside the chamber may be measured by interferometric techniques to determine change in film thickness and thus indicate when cleaning is required and the success of cleaning operations. A sapphire window may be used to allow for air cooling and to reduce etching by the plasma. A fiber optic cable may communicate the light between the window and measurement electronics.