Anthony K Quick

Title: Inventor Spotlight: Anthony K. Quick

Introduction

Anthony K. Quick is an innovative inventor based in Madison, WI, with a notable contribution to the field of plasma processing technology. His expertise is demonstrated through his patent on a specialized sensor designed to improve manufacturing processes in plasma chambers. This invention not only highlights his creative problem-solving abilities but also reflects the advancements in precision measurement within the industry.

Latest Patents

Quick holds a patent for a "Wall deposition thickness sensor for plasma processing chamber." This device plays a crucial role in measuring the polymer build-up on plasma chamber walls. It features a cooled window that allows a film to form, enabling light to pass through it. Utilizing interferometric techniques, the device measures changes in film thickness, which can indicate the necessity for cleaning and evaluate the effectiveness of cleaning efforts. The design includes a sapphire window that facilitates air cooling and minimizes etching caused by plasma. Additionally, the invention employs a fiber optic cable to relay light signals to the measurement electronics, enhancing the accuracy and reliability of the readings.

Career Highlights

Anthony K. Quick is associated with the Wisconsin Alumni Research Foundation, where he has made significant strides in developing cutting-edge technologies. His work exemplifies the foundation's commitment to fostering innovation and supporting the growth of research outcomes in practical applications.

Collaborations

Throughout his career, Quick has collaborated with esteemed colleagues, including Moshe Sarfaty and Noah H. Hershkowitz. These partnerships have further enriched his work, allowing for a blend of expertise that drives research and development in the field of plasma technology.

Conclusion

Anthony K. Quick's contributions to the realm of plasma chamber technology through his inventive spirit demonstrate the importance of innovation in advancing industrial processes. His patented wall deposition thickness sensor is a testament to his skill and dedication, promising a more efficient and effective approach to plasma processing. With ongoing collaborations and a strong foundation in research, Quick continues to make significant impacts that will likely benefit the industry for years to come.