Company Filing History:
Years Active: 1996-2002
Title: Moshe Eizenberg: Innovator in Semiconductor Technology
Introduction
Moshe Eizenberg is a prominent inventor based in Haifa, Israel. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on developing advanced materials and methods that enhance the performance and stability of semiconductor devices.
Latest Patents
One of Eizenberg's latest patents involves technology for thermodynamically stable contacts for binary wide band gap semiconductors. This innovation presents a thermodynamically stable metallic contact for binary oxide, nitride, carbide, or phosphide semiconductors, along with a method for its preparation. The contact is formed through a high-temperature reaction in a vacuum using a metal bi-layer with the binary semiconductor substrate. By carefully selecting the two metallic layers, each metal forms a single phase with only one of the binary semiconductor elements. The resulting phases create distinct layers in a thermodynamically stable sequence. Another notable patent involves the utilization of SiH4 soak and purge in deposition processes, which further enhances the efficiency of semiconductor manufacturing.
Career Highlights
Throughout his career, Moshe Eizenberg has worked with leading companies in the semiconductor industry, including Applied Materials, Inc. His expertise and innovative approaches have positioned him as a key figure in advancing semiconductor technologies.
Collaborations
Eizenberg has collaborated with notable professionals in his field, including Meng Chu Tseng and Susan G. Telford. These partnerships have contributed to the development of groundbreaking technologies and have fostered a collaborative environment for innovation.
Conclusion
Moshe Eizenberg's contributions to semiconductor technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in semiconductor materials and methods, paving the way for future innovations.