Moon-gyu Sung

Title: The Innovations of Moon-gyu Sung in Photomask Technology

Introduction

Moon-gyu Sung, an esteemed inventor based in Seoul, South Korea, has made significant strides in the field of photomask technology. With two notable patents to his name, his work is instrumental in enhancing the quality and performance of photomasks used in various electronic applications.

Latest Patents

Sung's latest patents demonstrate his innovative approach to solving complex issues in photomask manufacturing. The first patent, titled "Defect Repair Method for Photomask and Defect-Free Photomask," outlines a method of repairing photomasks that contain depression defects. This process involves creating a protection layer over the defect, etching the substrate, and producing a defect-free photomask, thereby improving the final product's reliability.

His second patent, "Photo Mask and Method of Correcting the Transmissivity of a Photo Mask," addresses discrepancies in transmissivity that can compromise the precision of patterns formed through photomasking. It describes a photomask that consists of a transparent substrate and a light-shielding layer pattern. This invention allows for the doping of specific sites on the substrate to ensure that the critical dimensions of the patterns produced are consistently aligned with their intended specifications.

Career Highlights

Moon-gyu Sung has established himself as a valuable asset at Samsung Electronics Co., Ltd., where he leverages his technical expertise and innovative mindset to advance the company's capabilities in photomask technology. His dual patents reflect his commitment to excellence and his proactive approach to overcoming challenges in the field.

Collaborations

Throughout his career, Sung has collaborated with talented coworkers, including Hong-seok Sim and Sang-hyeon Lee. These partnerships contribute to a dynamic work environment where ideas flow freely and innovation thrives, ultimately enhancing the research and development efforts at Samsung Electronics.

Conclusion

Moon-gyu Sung's contributions to photomask technology underscore the importance of innovation in the ever-evolving landscape of electronics. His patents not only showcase his inventive spirit but also play a crucial role in ensuring high-quality production standards within the industry. As Sung continues to push the boundaries of technology, his work will undoubtedly inspire future advancements in photomask manufacturing.