Gwangmyeong, South Korea

Moon Chul Kum

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Wonik Ips Co., Ltd.. Active years: 2026.

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Moon Chul Kum - Innovator in Substrate Processing Technology

Introduction

Moon Chul Kum is a notable inventor based in Gwangmyeong, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative approach has led to the development of a unique apparatus that enhances the efficiency of substrate processing.

Latest Patents

Moon Chul Kum holds a patent for a substrate processing apparatus. This invention relates to a substrate processing apparatus designed to operate at both high and low pressures. The apparatus includes a process chamber with an inner space, an installation groove defined at the central side of the bottom surface, and a substrate support that allows for effective substrate seating. The design also features an inner lid part that moves vertically to create a sealed processing space, ensuring optimal conditions for substrate processing.

Career Highlights

Throughout his career, Moon Chul Kum has demonstrated a commitment to innovation and excellence in his field. His work at Wonik Ips Co., Ltd. has positioned him as a key player in the development of advanced substrate processing technologies. His patent reflects his expertise and dedication to improving manufacturing processes.

Collaborations

Moon Chul Kum has collaborated with talented individuals such as Tae Dong Kim and Jung Hwan Lee. These partnerships have contributed to the successful development of his innovative technologies.

Conclusion

Moon Chul Kum is a distinguished inventor whose work in substrate processing technology has made a significant impact. His patent showcases his innovative spirit and commitment to advancing the field.

Profile summary based on public USPTO records.
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