Hwaseong, South Korea

Moohyun Koh

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignees: Samsung Electronics Ltd., Samsung Sdi., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Moohyun Koh. Retrieved from https://idiyas.com/inventor/moohyun-koh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Moohyun Koh - Innovator in Photoresist Compositions

Introduction

Moohyun Koh is an inventor based in Suwon-si, South Korea. He has made significant contributions to the field of integrated circuit manufacturing through his innovative patent applications. Although he currently holds no granted patents, his work in photoresist compositions showcases his expertise and potential in the industry.

Latest Patent Applications

Moohyun Koh's notable patent application is titled "PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME." This application describes a photoresist composition that includes an organometallic compound featuring at least one metal-ligand bond, a metal core, and at least one organic ligand bonded to the metal core. Additionally, it incorporates at least one first organic ligand precursor, which differs in chemical structure from the organic ligand of the organometallic compound and includes a sulfonic acid group. The application outlines a method for manufacturing integrated circuit devices by forming a photoresist film on a substrate using this composition.

Conclusion

Moohyun Koh's innovative approach to photoresist compositions highlights his potential impact on the field of integrated circuit manufacturing. His ongoing work may lead to significant advancements in technology and materials used in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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